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Collect. Czech. Chem. Commun. 1995, 60, 372-382
https://doi.org/10.1135/cccc19950372

Adsorption and Thermal Decomposition of Tetrakis(dimethylamido)titanium on Si and SiO2/Si Surfaces: an XPS Study

Michaela Janovská and Zdeněk Bastl

J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, 182 23 Prague 8, Czech Republic

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  • Rodríguez-Reyes Juan Carlos F., Teplyakov Andrew V.: Chemisorption of Tetrakis(dimethylamido)titanium on Si(100)-2 × 1: C−H and C−N Bond Reactivity Leading to Low-Temperature Decomposition Pathways. J. Phys. Chem. C 2008, 112, 9695. <https://doi.org/10.1021/jp800436w>
  • Rodríguez‐Reyes Juan Carlos F., Teplyakov Andrew V.: Chemistry of Organometallic Compounds on Silicon: The First Step in Film Growth. Chemistry A European J 2007, 13, 9164. <https://doi.org/10.1002/chem.200700856>
  • Rodríguez-Reyes Juan Carlos F., Teplyakov Andrew V.: Chemistry of Diffusion Barrier Film Formation:  Adsorption and Dissociation of Tetrakis(dimethylamino)titanium on Si(100)-2 × 1. J. Phys. Chem. C 2007, 111, 4800. <https://doi.org/10.1021/jp067929b>
  • Janovská M., Bastl Z.: IR laser induced decomposition of tetrakis(dimethylamido)titanium for chemical vapor deposition of TiNx. Infrared Physics & Technology 1996, 37, 727. <https://doi.org/10.1016/S1350-4495(96)00006-0>